CWL(center of wavelength): H-Alpha 656.3nm/SII 671.6nm/OIII 500.7nm
Fwhm: H-Alpha7nm/SII 6.5nm/OIII6.5nm
Tpeak: <85%
Optical Density: OD 3
Surface Quality: 60/40
Transmitted Wavefront RMS: λ/4
Parallelism(arcsec): 30s
Manufacturing Technique
Fine-optically polishing for double-sides—— Ensure accurate λ/4 wavefront /*C*and*C*/ <30 seconds parallalism over the both surfaces
Ultrasonic wave cleaning substrate with purified water—— Cleanup by 13 purified water tank to remove inpurities /*C*and*C*/ dust effectively
Iro source assisted coating—— For durability /*C*and*C*/ resistance to scratching, as well as stability on CWL (central wavelength) no deviation affected by temperature change.
Constantly stringent quality testing processes—— Each filter was tested by spectrophotometer /*C*and*C*/ laser interferometer testing spectrum /*C*and*C*/ wavefront to ensure market filter is qualified product